MA300 AUTOMATED STATION
The MA300 Automated Station based on the microscope working in the UV spectrum (365 nm) is designed for inspection of the elements of IC patterns on semiconductor wafers with the dimensions from 0.18 µm and more.
The MA300 is equipped with a sextuple electromechanically driven revolving nosepiece. Additionally the Station is equipped with an 150×/0.9 UV objective (the resolution is no less than 3300 lines/mm, designed for 365±10nm wavelength) and a mercury lamp illuminator.
The Station is equipped with either a manual or a software-controlled stage and a focusing device enabling to inspect the elements of the IC patterns on Ø200 mm semiconductor wafers.
Order
Objectives
5×
10х
20х
50х
100х
100×UV
150×UV
Numerical aperture
0.15
0.25
0.45
0.80
0.90
0.90
0.90
Working distance, mm
4.60
2.25
1.30
0.55
0.32
0.20
0.15
Linear field of view, mm, not less than
4.40
2.20
1.10
0.43
0.21
0.05*
0.05*
Visual channel magnification with an 10× eyepiece, times
50
100
200
500
1000
1000**
1500**
Visual resolution, lines/mm, not less than
400
750
1200
1800
2400
3300
3300
Revolving nosepiece
sextuple, electromechanically driven
Illumination
a) for the visible spectrum – a halogen lamp 12V, 100W
b) for the ultraviolet region – a mercury-arc lamp or a LED
c) for transmitted light – a LED
Stage movement (both manual and automated) along X-, Y-axes, mm
from 0 to 200
Automated stage movement error along X-, Y-axes, µm, not more than
±3
Discreteness of the automated stage movement along X-, Y-axes, µm, not more than
0.2
Discreteness of the automated stage movement for motorized focusing along Z-axis, µm, not more than
0.06
* - camera registered field of view
** - magnification transmitted to the camera
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The MA300 Automated Station based on the microscope working in the UV spectrum (365 nm) is designed for inspection of the elements of IC patterns on semiconductor wafers with the dimensions from 0.18 µm and more.
The MA300 is equipped with a sextuple electromechanically driven revolving nosepiece. Additionally the Station is equipped with an 150×/0.9 UV objective (the resolution is no less than 3300 lines/mm, designed for 365±10nm wavelength) and a mercury lamp illuminator.
The Station is equipped with either a manual or a software-controlled stage and a focusing device enabling to inspect the elements of the IC patterns on Ø200 mm semiconductor wafers.
Order| Objectives | 5× | 10х | 20х | 50х | 100х | 100×UV | 150×UV |
| Numerical aperture | 0.15 | 0.25 | 0.45 | 0.80 | 0.90 | 0.90 | 0.90 |
| Working distance, mm | 4.60 | 2.25 | 1.30 | 0.55 | 0.32 | 0.20 | 0.15 |
| Linear field of view, mm, not less than | 4.40 | 2.20 | 1.10 | 0.43 | 0.21 | 0.05* | 0.05* |
| Visual channel magnification with an 10× eyepiece, times | 50 | 100 | 200 | 500 | 1000 | 1000** | 1500** |
| Visual resolution, lines/mm, not less than | 400 | 750 | 1200 | 1800 | 2400 | 3300 | 3300 |
| Revolving nosepiece | sextuple, electromechanically driven | ||||||
| Illumination |
a) for the visible spectrum – a halogen lamp 12V, 100W
b) for the ultraviolet region – a mercury-arc lamp or a LED c) for transmitted light – a LED |
||||||
| Stage movement (both manual and automated) along X-, Y-axes, mm | from 0 to 200 | ||||||
| Automated stage movement error along X-, Y-axes, µm, not more than | ±3 | ||||||
| Discreteness of the automated stage movement along X-, Y-axes, µm, not more than | 0.2 | ||||||
| Discreteness of the automated stage movement for motorized focusing along Z-axis, µm, not more than | 0.06 | ||||||
* - camera registered field of view
** - magnification transmitted to the camera