Development and manufacture of microscopes and microscope-based inspection systems

MICRO 200 (T)-01 microscope

  The MICRO 200-01 and MICRO 200T-01 microscopes are designed for inspection of semiconductor wafers and photomasks in production of various electronic components as well as for research in other fields of science and technology.

   Microscope observation modes:

        ∙reflected brightfield and darkfield observation (MICRO 200-01);

     ∙transmitted brightfield observation, reflected brightfield and darkfield observation (MICRO 200T-01);

                                                                                     ∙reflected polarization contrast* and differential interference contrast* observation.

 

Order

Objectives (Plan Apochromats)

 5× 10× 20× 50× 100×
Numerical aperture 0.15 0.25 0.45 0.80 0.90
Objective working distance, mm 4.60 2.25 1.30 0.55 0.32
Resolution, lines/mm, not less than 400 750 1200 1800 2400
Linear field of view, mm 4.40 2.20 1.10 0.43 0.21
Visible magnification with 10× eyepiece, times 50 100 200 500 1000
Maximum magnification of visual channel, times 150 300 600 1500 3000
Revolving nosepiece - quintuple, electromechanically driven
Stage - rotatable, manual
Stage movement along X-, Y-axes, mm 200x200
Stage movement along Z-axis, mm 27
Sensitivity of ne focusing, µm/turn 0.16
Overall dimensions, mm 745х530х500
Weight, kg (MICRO200-01/MICRO200T-01) 40/45
 

 

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